As the incoming editorial team for Technology and Culture, we are dedicated to increasing the journal’s accessibility by creating larger audiences for our research articles.
We are looking for submissions that speak to a global audience beyond your topic to help shed light on its significance for scholars working in other topics. Also important is to indicate how your topic is relevant for today’s scholarship. Finally, we would like you to consider how your manuscript would be taught in the classroom.
In all submissions, we are looking to see—at a minimum—a discussion of:
These points should be made clear in the abstract.
Submission of a manuscript implies your assurance that the content has not previously been published in form or in substance, and that the manuscript is not under consideration elsewhere.
Manuscripts may be submitted via Scholastica, our electronic submission system: technology-and-culture.scholasticahq.com/. You will have to create a user id on Scholastica to proceed.) We do not accept hard copy submissions. Email submissions will only be accepted if the author is unable to access the Scholastica system.
We can work with files in any common Mac or Windows word processor format, but World Files are preferred. Please do not send a PDF file. Articles are selected by double-blind peer review. The only place your name should appear is on a separate title page; please be sure to remove any self-referencing footnotes as well. If your identity is obvious from the manuscript, it cannot be sent out for review.
Length, format, and style: We have a word limit of 7,500 words (without footnotes) per article, with a maximum of 100 footnotes. Footnotes should not be discursive: if the information is important, put it in the text! We have a limit of six illustrations and or tables. Please upload your illustrations as individual files, do not embed them in the text but upload them on Scholastica as individual files. If you feel that you need to exceed one of these limits significantly, please consult the managing editor (email@example.com). Make sure, however, that the manuscript file has callouts indicating where each figure should be placed.
Please use a standard font (e.g., Arial, Times New Roman) in a standard size (12 point). Use minimal formatting. Double space everything, including block quotations, notes, and figure captions, and leave adequate margins. Do not embed illustrations or tables in the text; send them as separate files instead. For notes, we use the Chicago Manual of Style’s footnotes-bibliography style.
The Hopkins Press Journals Ethics and Malpractice Statement can be found at the ethics-and-malpractice page.
Technology and Culture (T&C) seeks to publish outstanding, original contributions to research in the history of technology. Manuscript submissions should not be published or under review elsewhere. The editorial team pre-screens all articles for suitability to the journal’s mission and soundness of scholarship. Submissions accepted for review are sent to two or three peer reviewers, who are given two months to respond. Peer reviewing is double-blind. Referees evaluate the quality and reliability of the scholarship, and its relevance for T&C’s broad readership. If referees request revisions, the manuscript may go through multiple rounds of peer review; whenever possible, the same reviewers will read the manuscript through each round of review.
Ruth Oldenziel, Eindhoven University of Technology
Mor Lumbroso, Foundation for the History of Technology/Eindhoven University of Technology
Dick van Lente, Foundation for the History of Technology/Eindhoven University of Technology
Henk-Jan Dekker, Eindhoven University of Technology
Leon Vauterin, Eindhoven University of Technology
Johannes Geert-Hagmann, Deutsches Museum
Yakup Bektas, Tokyo Institute of Technology, Japan
Keith Breckenridge, University of Witwatersrand, South Africa
Lino Camprubi, University of Seville, Spain
Yao Dazhi, Chinese Academy of Science, China
Cornelis Disco, Independent Scholar, France
Donna Drucker, Technical University of Darmstadt, Germany
Rayvon Fouché, Purdue University, U.S.A.
Alexander C. T. Geppert, New York University, U.S.A.
Anna Guagnini, University of Bologna, Italy
Liliane Hilaire-Pérez, Université Paris Diderot, France
Chihyung Jeon, Korean Advanced Institute for Science and Technology, South Korea
Eda Kranakis, University of Ottawa, Canada
Leonard Laborie, Centre national de la recherche scientifique, France
Angela Leung, University of Hong Kong, China
Pamela O. Long, Washington, D.C., USA
Carlos López Galviz, University of Lancaster, UK
John Lourdusamy, Indian Institute of Tech Madras, India
Harro Maat, University of Wageningen, The Netherlands
Patrick McCray, University of California, Santa Barbara, USA
Cyrus Mody, Maastricht University, The Netherlands
Jahnavi Phalkey, Science Gallery, India
David Pretel, Universitat Pompeu Fabra, Spain
Andrew Russell, SUNY Polytechnic Institute, USA
Luisa Sousa, New University of Lisbon, Portugal
Helmuth Trishler, Deutsches Museum, Germany
Matteo Valeriani, Max Planck Institute for the History of Science, Germany, and Tel Aviv University, Israel
Dhan Zunino Singh, University of Quimes, Argentina
Geoff Zylstra, New York City College of Technology, USA
Melvin Kranzberg, 1959–81
Robert C. Post, 1982–95
John M. Staudenmaier, S.J., 1996–2010
Suzanne Moon, 2010-2020
Eindhoven University of Technology
Foundation for the History of Technology
Book review information can be obtained by contacting:
Dick van Lente
Please send book review copies to the contact above. Review copies received by the Johns Hopkins University Press office will be discarded.
Source: Ulrichsweb Global Serials Directory.
988 Total Cites (2021)
0.841 (Five-Year Impact Factor)
0.00091 (Eigenfactor™ Score)
Rank in Category (by Journal Impact Factor):
51 of 104 journals, in “History & Philosophy of Science”
Quartile - Q2
© Clarivate Analytics 2022
Readers include: Historians of technology; engineers and scientists in many fields; environmental, urban, and intellectual historians; anthropologists, sociologists, and political scientists; teachers, museum professionals, and archivists; and the general public
Print circulation: 1,075
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"Always full of surprises, Technology and Culture is the liveliest, most thought-provoking journal that I read."
Ruth S. Cowan | Professor of History and Chair of the Honors College, SUNY-Stony Brook
"As a research tool, a teaching aid, and a fount of reading pleasure, Technology and Culture over three decades has contributed more than any other source to our understanding of the ways in which technology shapes history."
Thomas P. Hughes | Author of Rescuing Prometheus
"Technology and Culture is an invaluable resource for anyone interested in the history of technology and its implications for the present and the future. Every issue of the journal is full of insight and information, and the book review section is without in the field."
Henry Petroski | A.S. Vesic Professor of Civil Engineering and Professor of History, Duke University
"The ability to not only use technology but also critically reflect upon its historical and social implications is crucial to humanistic studies as well as the technical disciplines. Technology and Culture is the only academic journal exclusively devoted to this essential task and is thus a core journal for us, protected from the ravages of budget cuts for serials."
Andrew D. Scrimgeour | Dean of Libraries, Regis University
eTOC (Electronic Table of Contents) alerts can be delivered to your inbox when this or any Hopkins Press journal is published via your ProjectMUSE MyMUSE account. Visit the eTOC instructions page for detailed instructions on setting up your MyMUSE account and alerts.
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